SKIN1004 Madagascar Centella Watergel Sheet Ampoule Mask

Dehydrated
Sensitive

$2.90

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Recharge skin with SKIN1004 Madagascar Centella Watergel Sheet Ampoule Mask. Infused with centella-rich ampoule, this mask hydrates, soothes, and strengthens skin for a refreshed, glowing complexion.

Key Benefits

Provides intense hydration
Soothes redness and irritation
Strengthens skin barrier
Centella Asiatica Extract: calming and repairing
Hyaluronic Acid: deep hydration

Safety Information

For external use only. Avoid contact with the eyes. If contact occurs, rinse thoroughly with water. Discontinue use if irritation or discomfort occurs. Do not apply to broken or irritated skin. Store in a cool, dry place away from direct sunlight. Keep out of reach of children. Patch test before first use. Individual results may vary.

MADE IN KOREA

Apply mask onto cleansed skin, leave for 15–20 minutes, remove and pat essence.

Centella Asiatica Extract (51%), Water, Dipropylene Glycol, Glycereth-26, Glycerin, 1,2-Hexanediol, Betaine, Butylene Glycol, Paeonia Suffruticosa Root Extract, Polyglyceryl-10 Laurate, Chamomilla Recutita (Matricaria) Flower Extract, Glyceryl Caprylate, Carbomer, Xanthan Gum, Arginine, Ethylhexylglycerin, Sodium Hyaluronate, Dextrin, Theobroma Cacao (Cocoa) Extract, Propanediol, Coptis Japonica Root Extract, Mentha Arvensis Leaf Oil, Sodium Hyaluronate Crosspolymer, Hydrolyzed Glycosaminoglycans, Benzyl Glycol, Hydrolyzed Hyaluronic Acid, Hyaluronic Acid, Raspberry Ketone, Disodium EDTA

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About this mask

Description

Recharge skin with SKIN1004 Madagascar Centella Watergel Sheet Ampoule Mask. Infused with centella-rich ampoule, this mask hydrates, soothes, and strengthens skin for a refreshed, glowing complexion.

Key Benefits

Provides intense hydration
Soothes redness and irritation
Strengthens skin barrier
Centella Asiatica Extract: calming and repairing
Hyaluronic Acid: deep hydration

For external use only. Avoid contact with the eyes. If contact occurs, rinse thoroughly with water. Discontinue use if irritation or discomfort occurs. Do not apply to broken or irritated skin. Store in a cool, dry place away from direct sunlight. Keep out of reach of children. Patch test before first use. Individual results may vary.

MADE IN KOREA

How to use

Apply mask onto cleansed skin, leave for 15–20 minutes, remove and pat essence.

Ingredients

Centella Asiatica Extract (51%), Water, Dipropylene Glycol, Glycereth-26, Glycerin, 1,2-Hexanediol, Betaine, Butylene Glycol, Paeonia Suffruticosa Root Extract, Polyglyceryl-10 Laurate, Chamomilla Recutita (Matricaria) Flower Extract, Glyceryl Caprylate, Carbomer, Xanthan Gum, Arginine, Ethylhexylglycerin, Sodium Hyaluronate, Dextrin, Theobroma Cacao (Cocoa) Extract, Propanediol, Coptis Japonica Root Extract, Mentha Arvensis Leaf Oil, Sodium Hyaluronate Crosspolymer, Hydrolyzed Glycosaminoglycans, Benzyl Glycol, Hydrolyzed Hyaluronic Acid, Hyaluronic Acid, Raspberry Ketone, Disodium EDTA